DC Magnetron Sputtering
In general vacuum deposition methods divided into two general categories: chemical vapor deposition (CVD) and physical vapor deposition (PVD). One of the methods of physical vapor deposition is magnetic sputtering method. In this method plasma brought the target to vapor state and coats to the desired substrate. One of the former problems of this method was the low deposition rate that took away this method from industrial point of view. But in recent years with the advent of magnetic nonequilibrium sputtering and then devised a method of close-circuit nonequilibrium magnetic sputtering, deposition rate significantly improved and hence this method has its place in the industry.
Using this method, layers of metal oxides, nitrides, carbides could be applied on the substrate. The main advantages of this method compared to other methods are as follows:
- The deposition is performed at a temperature bellow 300 °C. (Problems with evaporation and CVD)
- Choosing the right material (high purity target), very convenient layers with high purity and absence of coarse particles is available in the coating (problem of Arc-PVD).
Kavosh Yaran Fann-e Pouya provides service for DC sputtering coating of surface in laboratory scale. Please contact us for more information and to discuss your specific needs..